摘要 |
<p>PROBLEM TO BE SOLVED: To improve the smoothness of a substrate surface and polish the subject substrate without deteriorating a polishing working rate of a glass ceramics substrate material having a high hardness and a high Young's modulus by using a specific substance as a polishing material in a polishing liquid. SOLUTION: ZrO2 or Al2O3 or both preferably having 0.2-2.0μm grain diameter are used as a polishing material in a polishing liquid preferably at pH 8-11 in a polishing working to carry out the polishing working of a glass ceramics substrate for an information memorizing medium. The content of the ZrO2 and/or Al2O3 in the polishing liquid is preferably 3-25 wt.%. An SiO2-Al2O3-Li2O- based glass ceramics, SiO2-Al2O3-RO-TiO2 (R is an alkaline earth metal)-based glass ceramics, or the like, are cited as the glass ceramics substrate to be subjected to the polishing working.</p> |