发明名称 Semiconductor device having capacitor and manufacturing apparatus thereof
摘要 A semiconductor device comprising an integrated circuit and a capacitor. In this capacitor, a bottom electrode, a dielectric film and a top electrode are formed, independently of the integrated circuit, on the interlayer insulating film, and the top electrode and bottom electrode are connected with metal interconnections through contact holes opened in the protective film for protecting the surface of the capacitor. In this constitution, either the top electrode or the bottom electrode is connected the bias line of the integrated circuit, and the other is connected to the ground line, so that extraneous emission may be reduced without having to connect the capacitor outside.
申请公布号 US6126752(A) 申请公布日期 2000.10.03
申请号 US19970947712 申请日期 1997.10.09
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 FUJII, EIJI;SHIMADA, YASUHIRO;UEMOTO, YASUHIRO;HAYASHI, SHINITIROU;NASU, TOORU;ARITA, KOICHI;INOUE, ATSUO;MATSUDA, AKIHIRO;KIBE, MASAKI;OOTSUKI, TATSUO
分类号 H01L21/02;H01L21/8242;H01L21/8246;H01L27/06;H01L27/115;H01L29/92;(IPC1-7):B05B5/057 主分类号 H01L21/02
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