发明名称 SUBSTRATE HEATER AND PREPARATION CHAMBER
摘要 <p>PROBLEM TO BE SOLVED: To obtain a substrate heater capable of heating, in particular a transparent substrate such as a glass substrate or the like by the use of a lamp in a substrate heater. SOLUTION: A substrate heater 1 has a wavelength conversion plate 3, which shifts the maximum intensity wavelength of lights emitted from a halogen lamp 2 to long wavelength side and is irradiated onto a glass substrate 4. Since the lights emitted from the wavelength conversion plate 3 and shifted to the side of maximum intensity wavelength are efficiently absorbed into the glass substrate 4 too, it is possible to increase the temperatures of the glass substrate 4 at a high rate.</p>
申请公布号 JP2000269156(A) 申请公布日期 2000.09.29
申请号 JP19990073207 申请日期 1999.03.18
申请人 ULVAC JAPAN LTD 发明人 SUESHIRO SEISUKE;SATO SHIGEMITSU;OZORA HIROKI
分类号 H01L21/683;G02F1/1333;H01L21/26;H01L21/68;(IPC1-7):H01L21/26 主分类号 H01L21/683
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