发明名称 SEMICONDUCTOR DEVICE, ITS MANUFACTURE AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a thin-film transistor in which a semiconductor channel region is patterned. SOLUTION: On a glass substrate 101, a gate electrode 102, a gate insulting film 103, a source electrode 104, and a drain electrode 105 are formed, thereon a patterned insulating film is formed, and a region 110 on the gate electrode is removed. An organic semiconductor film is vapor-deposited on the removed region. An organic semiconductor film 107, formed in the region 110 where the patterned insulating film was removed, turns into a channel region and is isolated from the organic semiconductor film 108 on a patterned insulating film 106. That is, the organic semiconductor channel region is patterned in equal size as the gate electrode.</p>
申请公布号 JP2000269504(A) 申请公布日期 2000.09.29
申请号 JP19990069529 申请日期 1999.03.16
申请人 HITACHI LTD 发明人 ISHIHARA SHINGO;WAKAGI MASATOSHI;ANDO MASAHIKO
分类号 H01L51/05;G02F1/136;G02F1/1368;H01L21/311;H01L21/336;H01L27/28;H01L29/49;H01L29/786;H01L51/00;(IPC1-7):H01L29/786 主分类号 H01L51/05
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