发明名称 APPARATUS FOR PLASMA TREATMENT, AND METHOD FOR MAINTENANCE OF THE APPARATUS FOR PLASMA TREATMENT
摘要 PROBLEM TO BE SOLVED: To realize an apparatus and a method for plasma treatment which facilitate replacement of parts and an operation for maintenance inside a treatment chamber. SOLUTION: An apparatus for plasma treatment, which has a vacuum vessel, having a treatment chamber 100 formed inside, plasma generating devices 110 and 101 for generating plasma in the treatment chamber 100 and an electrode holding a sample treated in the treatment chamber 100. In this apparatus, a part of the upper wall of the vacuum vessel is made openable and closable, and at least one (110) of components constituting the apparatus is disposed in this openable and closable part. The side inside the treating chamber of the openable and closable part is opened at an angle which is directed upward with the component held thereon, when this part is opened.
申请公布号 JP2000269183(A) 申请公布日期 2000.09.29
申请号 JP19990072577 申请日期 1999.03.17
申请人 HITACHI LTD 发明人 MASUDA TOSHIO;KANEKIYO HIROSHI;FUJIMOTO TETSUO;SUEHIRO MITSURU;MATANO KATSUJI;TAKAHASHI NUSHITO
分类号 H01L21/302;B01J3/02;C23C16/509;H01J37/32;H01L21/00;H01L21/3065;H01L21/683;(IPC1-7):H01L21/306 主分类号 H01L21/302
代理机构 代理人
主权项
地址