| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide the coating liquid for the positive resist good in sensitivity, resolution, heat resistance, focal depth characteristic, the sectional form of a resist pattern, stability during time left unused, and dependence on a substrate, especially restrained from occurrence of defects after development. SOLUTION: The coating fluid for the positive resist restrained from occurrence of defects is prepared by dissolving a polymer having hydroxystyrene units having the hydroxyl groups protected with acid-dissociable groups and having the nonprotected hydroxy groups and an acid generator into a solvent mixture comprising propyleneglycol monoalkyl ether acetate and an excess amount of hydroxyl organic solvent having a boiling point of 80-200 deg.C.</p> |
