| 摘要 |
PROBLEM TO BE SOLVED: To conduct an exposure process in a specified inert gas atmosphere by supplying an inert gas to a first and a third container from a first gas supplying means through a gas supply line, and supplying an inert gas to a space between a second and the third container and a substrate through a gas supply line which is different from the one used when the gas is supplied from the first gas supplying means. SOLUTION: The light emitted from a light source EXL and reflected on a beam splitter Mp is reflected on a plurality of mirrors M properly disposed to be incident in a gas cell GS through a lens L. To the gas cell GS, a nitrogen gas is supplied through a pressure reducing valve RG. Then, the nitrogen gas is supplied through a valve V5 to a third container in a space where a substrate surrounding a reticle R is mounted. To a first container surrounding an illumination optical system IL and to a second container surrounding an objection optical system PL, a nitrogen gas is supplied by another gas supply line which is different from the one used when the nitrogen gas is supplied from the gas cell GS. |
