发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION FOR RAPID PROTOTYPING AND A PROCESS FOR THE MANUFACTURE OF 3-DIMENSIONAL OBJECTS |
摘要 |
The invention relates to a photosensitive resin composition for rapid prototyping comprising:a. about 30 wt. % to about 70 wt. % of at least two epoxy resins, at least one of these resins is solid at room temperature and comprises aromatic groups, and at least one of these resins is liquid, having a viscosity at 25° C. lower than about 1,000 Pa.s,b. about 15 wt. % to about 50 wt. % of at least one multifunctional acrylate compoundc. about 5 wt. % to about 30 wt. % of a hydroxyfunctional compoundd. about 1 wt. % to about 6 wt. % cationic photoinitiatore. about 1 wt. % to about 6 wt. % free radical photoinitiator.The invention further relates to a process for the manufacturing of 3-dimensional objects, known as rapid prototyping, wherein the photosensitive resin composition is used. |
申请公布号 |
EP0897558(B1) |
申请公布日期 |
2000.09.27 |
申请号 |
EP19970918429 |
申请日期 |
1997.05.07 |
申请人 |
DSM N.V. |
发明人 |
LAPIN, STEPHEN, C.;SULLIVAN, MICHAEL, G. |
分类号 |
B29C41/00;B29C67/00;C08G59/14;C08G59/40;G03F7/00;G03F7/038 |
主分类号 |
B29C41/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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