| 摘要 |
PROBLEM TO BE SOLVED: To obtain an extremely thin metallic thin film, on one side of a supporting body composed of an inorganic material of a metal, an alloy, or the like, having reactivity higher than that of the metal to be formed into a thin film, by forming a thin film layer of a metal having reactivity lower than that of the inorganic material and dissolving away the supporting body with a chemical of acid or alkali or the like. SOLUTION: In the case an inorganic material composing a supporting body is made of a metal easily dissolving into acid such as Zn, Fe and Cu, the metal to be formed into a thin film is limited to the one which is hard to be dissolved into acid compared to the case of the metal used for the supporting body, and, in the case of a metal dissolving into alkali such as Zn and Al, the metal to be formed into a thin film is limited to the one which does not dissolve into alkali. For forming these metals on one side of the supporting body, the method of electrodeposition, electroless plating, vapor deposition, sputtering, or the like, can be adopted. Among these methods, electrodeposition in which the coating weight is proportional to the electric current and uniformly executable in a wide range while the thickness is controlled is preferable.
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