发明名称 SEMICONDUCTOR DEVICE AND IT'S FABRICATION METHOD
摘要 PURPOSE: Semiconductor device provides decreased electrical resistance of BiCMOS semiconductor device. CONSTITUTION: Semiconductor device comprising a substrate(12), a bipolar transistor(14,16) having at least one of silicide layer surface of among an emitter(42), a base(26) and a collector(22); MOS transistor(18,20) including a gate electrode(40) having the silicide layer surface; the silicide of diffusion region of the bipolar transistor(14,16)
申请公布号 KR20000057826(A) 申请公布日期 2000.09.25
申请号 KR20000004279 申请日期 2000.01.28
申请人 NEC CORPORATION 发明人 YOSHITA HIROSHI
分类号 H01L29/73;H01L21/28;H01L21/8222;H01L21/8248;H01L21/8249;H01L27/06;H03L7/00;(IPC1-7):H01L29/73 主分类号 H01L29/73
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