发明名称 |
VERTICAL FUSE AND METHOD OF FABRICATION |
摘要 |
PURPOSE: A vertical fuse and fabrication method is prvided for reducing the area occupied by fuses on a semiconductor chip, and for adjusting the fuse resistance for the fuses in a semiconductor device. CONSTITUTION: A fuse for semiconductor devices includes a substrate having a conductive path disposed on a surface thereof, a dielectric layer disposed on the substrate and a vertical fuse disposed perpendicularly to the surface through the dielectric layer and connecting to the conductive path, the vertical fuse forming a cavity having a liner material disposed along vertical surfaces of the cavity, the vertical surfaces being melted to blow the fuse. |
申请公布号 |
KR20000058155(A) |
申请公布日期 |
2000.09.25 |
申请号 |
KR20000008763 |
申请日期 |
2000.02.23 |
申请人 |
INFINEON TECHNOLOGIES NORTH AMERICA CORPORATION;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
NARAYAN CHANDRASEKHAR;VAN DEN BERG ROBERT;HOINKIS MARK;IGGULDEN ROY;WEBER STEFAN J;BRINTZINGER AXEL CHRISTOPH |
分类号 |
H01H85/00;H01H69/02;H01L21/82;H01L23/525;(IPC1-7):H01L21/82 |
主分类号 |
H01H85/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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