发明名称 REAGENT SUPPLY VESSEL FOR CHEMICAL VAPOR DEPOSITION
摘要 PURPOSE: A reagent supply vessel is provided for deposition of materials in the manufacture of semiconductor materials and devices, and achieves a high level of withdrawal of the reagent liquid from the vessel. CONSTITUTION: A liquid reagent dispensing assembly (10), comprising a gas-pressurizable vessel (12) including a floor (18), and an interior volume (20) bounded by interior wall (14) and floor (34) surfaces. A dip-tube liquid discharge conduit (42) is employed for discharging liquid from the gas-pressurized vessel. The vessel is provided with a liquid level sensor (48)for sensing liquid reagent level in the vessel interior volume. The floor of the vessel has a cavity (28) therein extending downwardly from the surface of the floor, and the lower end (46) of the dip-tube is positioned in the cavity.
申请公布号 KR20000057606(A) 申请公布日期 2000.09.25
申请号 KR19997005391 申请日期 1999.06.16
申请人 ADVANCED TECHNOLOGY MATERIALS, INC. 发明人 BOUCHARD, FRED
分类号 B65D83/00;B01J4/00;B67D7/02;B67D7/32;C23C16/00;C23C16/448;C23C16/52;(IPC1-7):C23C16/00 主分类号 B65D83/00
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