发明名称 EXPOSURE SYSTEM FOR LARGE-SIZED BASE PLATE
摘要 PROBLEM TO BE SOLVED: To produce a large-sized liquid crystal display device at low cost with good yield by constituting an exposing light beam of band-like parallel beams and making it perpendicularly incident on a photomask by a reflection mirror optical system. SOLUTION: After adjusting the light beam of an ultraviolet laser 7 by an attenuator 8, beam width is extended to target one by using a cylindrical lens for converging 9. A trimming device 10 for shaping beam shape is installed midway. Then, the band-like parallel beams are formed by using a cylindrical lens for a collimator 11. The light quantity is averaged by a counter double prism 12. The band-like parallel beams 13 are bent by 90 degrees in terms of its advancing direction by a 45-degree reflection mirror 14 arranged in parallel with the photomask 1 and made perpendicularly incident on the photomask 1 and the glass base plate 2. Then, the mirror 14 is moved in parallel with the photomask.
申请公布号 JP2000258916(A) 申请公布日期 2000.09.22
申请号 JP19990115306 申请日期 1999.03.09
申请人 TANAKA SAKAE 发明人 TANAKA SAKAE
分类号 G02F1/13;G03F7/20;G03F7/23;(IPC1-7):G03F7/20 主分类号 G02F1/13
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