发明名称 HEAT TREATMENT OVEN
摘要 PROBLEM TO BE SOLVED: To provide a heat treatment oven capable of early detecting and solving trouble in an exhaust system. SOLUTION: This heat treatment oven 30 is provided with the following elements in addition to a conventional device configuration. The device is provided with a pressure sensor 32 in an exhaust pipe 14 for each oven chamber 12 and sends a pressure measurement value measured by the pressure sensor 32 as a signal to a exhaust observation system 22 via a line 34. Pressure indicators indicating the pressure measurement value displays the exhaust pressure in a digital form and are concentrated in a equipment front door. In the heat treatment oven, the exhaust observation system judges a normal or abnormal state of the exhaust system for each oven chamber based on the measurement value measured by the pressure sensor 32. There are provided an interlock system 42 for stopping operations of oven chambers 12 if abnormal states are detected and an automatic selection system 44 for selecting normal oven chambers simultaneously so that heat treatment is performed on wafers in these oven chambers.
申请公布号 JP2000260680(A) 申请公布日期 2000.09.22
申请号 JP19990058038 申请日期 1999.03.05
申请人 SONY CORP 发明人 BEPPU SHUJI
分类号 H01L21/027;G03F7/30;H01L21/02;(IPC1-7):H01L21/027 主分类号 H01L21/027
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