| 摘要 |
<p>A plasma-based method for the deposition of diamond-like carbon (DLC) coatings is described. The process uses a radio-frequency inductively coupled plasma source (12) to generate a plasma at relatively low gas pressures. The deposition process is environmentally friendly and scaleable to large areas, and components that have geometrically complicated surfaces can be processed. The method has been used to deposit adherent 100 - 400 nm thick DLC coatings on a substrate (22) of metals, glass, and polymers on a water-cooled substrate holder (16) which is biased with a negative-pulsed voltage generated by a pulsed-bias modulator (20). Boron and silicon doping of the DLC coatings have produced coatings having improved optical properties and lower coating stress levels, but with slightly lower hardness.</p> |
