| 摘要 |
PROBLEM TO BE SOLVED: To measure the surface temp. of an ITO film whose radiation coefficient is unknown in the process of a film forming process and to control the temp. of a substrate by using the measured temp. SOLUTION: A light source 5 of infrared light and a radiant intensity measuring apparatus 6 are arranged so as to be capable of measuring infrared light from the light source 5 reflected at the surface of an ITO film 1 by the radiant intensity measuring apparatus 6. Namely, optical paths 4 penetrate into the ITO film 1 at the same angle in both cases. A shutter 7 is opened and shuttered by a controller 9. When the shutter 7 is opened, the radiant intensity measuring apparatus 6 measures the total of the reflection of the light source 5 and the radiant intensity of heat radiation infrared rays. When the shutter 7 is shuttered, the radiant intensity measuring apparatus 6 measures only the radiant intensity of the heat radiation infrared rays from the ITO film 1. These measured values are transferred to a computing element 8, and the surface temp. of the ITO film is calculated. Then, based on the difference between the surface temp. of the ITO film and the temp. of a substrate, the temp. of the substrate is controlled.
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