METHOD OF FORMING TIN FILM ONTO HIGH-SPEED STEEL

摘要

PURPOSE: A method of forming TiN film onto a high- speed steel is provided to achieve a high hardness of substrate and a superior adhesion between the substrate and the TiN film while eliminating a heat-treatment process conventionally performed prior to vapor deposition process. CONSTITUTION: In a method for forming TiN film onto a high-speed steel by a chemical vapor deposition method, a TiN film is deposited at a temperature ranging 950 to 1250°C onto the high-speed steel substrate prevented from being performed with a series of heat-treatment processes, and the high-speed steel substrate is gas-quenched under nitrogen or Ar gas atmosphere.