| 摘要 |
PROBLEM TO BE SOLVED: To obtain a manufacturing method of the thin-film magnetic head which can make an etching speed fast and improve a mask selection ratio without corroding a magnetic layer, and further a device used for the implementation of the method. SOLUTION: Chlorine-based gas is introduced into a 1st chamber 1 to generate plasma, and an insulating layer formed by using alumina or AL2O3.TiC is etched. An arm for conveyance provided to a 3rd chamber 3 conveys a base material from the 1st chamber 1 to the 2nd chamber 2 through the 3rd chamber 3 which is evacuated. Oxygen-based gas is introduced into the 2nd chamber 2 to generate plasma, and resist provided to the base material and a part of reaction products produced through an etching process are ashed off with the above plasma. The base material ashing-processed is carried out to a washing unit 5 by a carrying-out device provided to a carrying-out load lock chamber 14, and the washing unit 5 washes the surface of the base material with pure water, while rotating the base material.
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