| 摘要 |
<p>PROBLEM TO BE SOLVED: To restrain scattering of electrons from an upper electrode so as to improve efficiency. SOLUTION: Fine holes are formed on an upper electrode 4 of an MIM type electron emitting element 21, constisting of a substrate 1, a lower electrode 2, an insulation layer 3 and the upper electrode 4. A catalyst metal such as Fe is used as the material for the electrode 4. Carbon fin particles are dispersed on the layer 3, and thereon a catalyst metal film is formed. The fin holes are formed by utilizing a phenomenon that carbon fin particles brought into contact with the catalytic metal react with oxygen or hydrogen to thereby disappear.</p> |
