发明名称 PROJECTION OPTICAL SYSTEM, PRODUCTION OF PROJECTION OPTICAL SYSTEM, PRODUCTION OF ILLUMINATION OPTICAL SYSTEM AND PRODUCTION OF EXPOSURE DEVICE
摘要 PROBLEM TO BE SOLVED: To secure necessary optical performance even in the case of using one or plural lenses whose refracting index is non-uniform by using one or plural lenses whose refractive index in the radial direction with an optical axis as center is non-uniform and providing one or plural aspherical surfaces for compensating aberration caused by the refractive index of the lens. SOLUTION: The aberration deteriorated by use in a state where refractive index distribution is non-uniform is compensated by the aspherical surface. A 1st lens group having positive refractive power mainly contributes to the compensation of distortion aberration while maintaining telecentricity on an object side. Namely, by causing the positive distortion aberration in the 1st lens group, the balance thereof with the negative distortion aberration caused in 2nd and 3rd lens groups is kept. The 2nd and the 4th lens groups having negative refractive power mainly contribute to the correction of Petzval's sum. Furthermore, the 2nd and the 4th lens groups form an inverted Galilean system, and contribute to the securement of the back focus of a projection optical system in addition to the adjustment of magnification. Then, 5th and 6th lens groups having positive refractive power restrain the occurrence of the distortion aberration and contribute to the restraint of the occurrence of spherical aberration.
申请公布号 JP2000249917(A) 申请公布日期 2000.09.14
申请号 JP19990342621 申请日期 1999.12.01
申请人 NIKON CORP 发明人 SUZUKI GOJI;TANAKA KAZUMASA
分类号 H01L21/027;G02B13/18;G02B13/24;G03F7/20;(IPC1-7):G02B13/24 主分类号 H01L21/027
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