发明名称 LIQUID METAL ION SOURCE AND FLOW IMPEDANCE MEASURING METHOD OF LIQUID METAL ION SOURCE
摘要 PROBLEM TO BE SOLVED: To execute normal operations, such as observation, etching or the like, and a measurement of a flow impedance in parallel, by measuring the flow impedance without changing an emission current. SOLUTION: Before operation of a device, a relation between an emission current variationΔIe and a suppressing voltage variationΔVsup in the state of an extraction voltage Vext fixed, is stored in a memory part 113 as a functionΔIe=f(ΔVsup). When measuring a flow impedance, the suppressed voltage variationΔVsup is detected at the time of changing the extraction voltage Vext byΔVext in the state of an emitter current Ie fixed. The flow impedanceΔVext/ΔIe is operated by using the voltage variationsΔVext,ΔVsup and the function taken in from the memory part 113.
申请公布号 JP2000251751(A) 申请公布日期 2000.09.14
申请号 JP19990051110 申请日期 1999.02.26
申请人 SEIKO INSTRUMENTS INC 发明人 SUGIYAMA YASUHIKO;OI MASAMICHI
分类号 H01J27/26;G01R27/02;H01J27/22;H01J37/08;H01J37/30;(IPC1-7):H01J27/26 主分类号 H01J27/26
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