发明名称 SUBSTRATE SURFACE TREATMENT DEVICE AND METHOD, SURFACE CONDUCTION TYPE ELECTRON SOURCE SUBSTRATE AND IMAGE FORMING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To enable cutting-off of liquid on a substrate simultaneously at the time of pulling up the substrate from treatment liquid, and ensure an even surface treatment for a large sized substrate by additionally providing a substrate conveying means to a treatment tank capable of storing treatment liquid therein, and providing an air knife to a delivery outlet of the tank. SOLUTION: A substrate is held on a substrate cassette 24, then mounted at a fixed position 25 on a conveying means 13, and conveyed to the inside of a device by the means 13. The substrate cassette 24 is held toy a carrying robot 11 and sank in a treatment liquid 17 from a delivery inlet 18 of a treatment tank 16. By repeating the above steps while working a conveying means 14, the cassette 24 reaches a terminal end, and when the cassette 24 is held by a carrying robot 12, air knives 20, 21 mounted to a delivery outlet 19 of the tank 16 work. Thereafter, the substrate held by the cassette 24 is pulled up from a substrate treatment liquid 17 and the liquid on the substrate is cut off simultaneously therewith.</p>
申请公布号 JP2000247437(A) 申请公布日期 2000.09.12
申请号 JP19990050681 申请日期 1999.02.26
申请人 CANON INC 发明人 KOJIMA MAKOTO
分类号 B65G49/02;B65G49/04;H01J9/02;(IPC1-7):B65G49/02 主分类号 B65G49/02
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