发明名称 Method for detecting defects in dielectric film
摘要 Disclosed are a method and an apparatus for detecting a defect in a dielectric film. The dielectric film is electrified in an electrolyte solution containing a metal in such a manner the dielectric film is charged negative, thereby the metal is deposited on the dielectric film at a position corresponding to the defect. The detecting method has a first deposition step for forming a first metal deposit on the dielectric film in an annular form surrounding the position corresponding to the defect; and a second deposition step for forming a second metal deposit located on the position corresponding to the defect, on the dielectric film. The detecting apparatus has a vessel for accommodating the electrolyte solution; a first electrode for electrifying the dielectric film and a second electrode; and an electric power source for controlably applying a voltage to electrifying between the first electrode and the second electrode in which a value and a direction of the applied voltage is variable.
申请公布号 US6118280(A) 申请公布日期 2000.09.12
申请号 US19980049201 申请日期 1998.03.27
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 MATSUNAGA, HIDEKI;SUZUKI, ISAO;TOMITA, HIROSHI;TAKENO, SHIRO;OKADA, AKIRA
分类号 G01N27/00;G01N1/28;G01N21/84;H01L21/66;(IPC1-7):G01N27/00 主分类号 G01N27/00
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