发明名称 |
Method for detecting defects in dielectric film |
摘要 |
Disclosed are a method and an apparatus for detecting a defect in a dielectric film. The dielectric film is electrified in an electrolyte solution containing a metal in such a manner the dielectric film is charged negative, thereby the metal is deposited on the dielectric film at a position corresponding to the defect. The detecting method has a first deposition step for forming a first metal deposit on the dielectric film in an annular form surrounding the position corresponding to the defect; and a second deposition step for forming a second metal deposit located on the position corresponding to the defect, on the dielectric film. The detecting apparatus has a vessel for accommodating the electrolyte solution; a first electrode for electrifying the dielectric film and a second electrode; and an electric power source for controlably applying a voltage to electrifying between the first electrode and the second electrode in which a value and a direction of the applied voltage is variable.
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申请公布号 |
US6118280(A) |
申请公布日期 |
2000.09.12 |
申请号 |
US19980049201 |
申请日期 |
1998.03.27 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
MATSUNAGA, HIDEKI;SUZUKI, ISAO;TOMITA, HIROSHI;TAKENO, SHIRO;OKADA, AKIRA |
分类号 |
G01N27/00;G01N1/28;G01N21/84;H01L21/66;(IPC1-7):G01N27/00 |
主分类号 |
G01N27/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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