| 摘要 |
PROBLEM TO BE SOLVED: To perform proximity exposure to a glass base plate whose size is larger than a photomask at high speed by raising an exposure chuck with respect to the photomask and performing exposure processing to a new glass base plate. SOLUTION: When a carrying-in arm 61 is retreated, a three-point contact type tilt driving motor is driven to raise the glass base plate 1 to a proximity gap controlling position. A proximity gap is controlled and accurate alignment is performed. At the point of time when the accurate alignment is finished, first exposure is performed to the right half of the plate 1. After finishing the exposure, the Z-axis of a base plate alignment stage 11 is driven to lower the plate 1, the exposure chuck 2 and a step table 41 from the photomask 3 by a very short distance. Then, the table 41 is moved stepwise to an unloader unit side (+X direction) so as to position the left half of the plate 1 and the photomask 3, then second exposure is performed to the left half of the plate 1.
|
