发明名称 METHOD AND SYSTEM FOR CALCULATING SHAPE OF RESIST
摘要 PROBLEM TO BE SOLVED: To reduce the calculating time of the shape of a resist, by expanding a kernel function of an optical system specific times as large as a diffusion length to bury zeros in the expanded portion, and by calculating the shape of the resist through using a new kernel function obtained from the convolution integral of the expanded kernel function and Gaussian function. SOLUTION: A kernel function of an optical system is expanded three times as large as a diffusion length to bury zeros in the expanded portion. The range of an optical proximity effect is represented by a table through calculating a kernel functionΦ,αfor representing the characteristic of the optical system (step 1). By using the equation ofΦ(x)=(Φ*g1/2) (x), the table of a newΦis calculated from the kernel functionΦand the Gaussian function g (step 2). Then, by using the equation of P(x)=Σαk|(t*Φ)(x)|2, the table ofΦis calculated from a shape function P and a transmittance (t) (step 3). The shape function P is calculated repeatedly over the whole range (step 4). In this way, by utilizing the range of the optical proximity effect and the property of the Gaussian function, the effect of the acid of a chemically amplifying resist is integrated into the kernel function for representing the characteristic of the optical system to reduce the calculating time through calculating the shape of a resist.
申请公布号 JP2000243694(A) 申请公布日期 2000.09.08
申请号 JP19990047026 申请日期 1999.02.24
申请人 NEC CORP 发明人 INUI HIROTOMO
分类号 H01L21/027;G03F7/20;G03F7/26;(IPC1-7):H01L21/027 主分类号 H01L21/027
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