发明名称 |
System and method for detecting particles produced in a process chamber by scattering light |
摘要 |
Particles generated within a semiconductor wafer process chamber are monitored by emitting a rastered laser beam into the process chamber and detecting a two-dimensional image of scattered radiant energy within the process chamber. A video frame representing a matrix array of pixel intensities is produced and processed by a processor. The processor receives first and second video frames, the first frame representing a matrix array of pixels of a background image of the process chamber before a wafer processing is started and the second frame representing a matrix array of corresponding pixels of a target image of the process changer after a wafer processing is started. Differential intensities between the pixels of the background image and corresponding pixels of the target image are detected and a decision is made on the detected intensities to produce an output signal representing presence or absence of the particles.
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申请公布号 |
US6115120(A) |
申请公布日期 |
2000.09.05 |
申请号 |
US19990413590 |
申请日期 |
1999.10.06 |
申请人 |
NEC CORPORATION |
发明人 |
MORIYA, TSUYOSHI;UESUGI, FUMIHIKO;ITO, NATSUKO |
分类号 |
G01N15/00;G01N15/02;G01N21/53;H01L21/66;(IPC1-7):G01N21/00 |
主分类号 |
G01N15/00 |
代理机构 |
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主权项 |
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地址 |
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