| 摘要 |
PURPOSE: A chemical supplying system is to control a flowing rate and pressure of a mixed hydrogen fluoride to meet a required processing condition. CONSTITUTION: A chemical supplying system comprises a solution supplying tank(1), a pipeline(4) for supplying a solution in the tank to a wet station(2) and a CMP(Chemical Mechanical Polishing) post cleaner(3), a pump(5), provided in the pipeline, for pumping the solution, a circulating duct(7) for circulating the solution for removing a different substance, a nitrogen gas supplying duct(8), connected to the solution supplying tank, for supplying a nitrogen gas into the solution supplying tank, and a mixing module(9) provided in a front of the solution pipeline. A fitting(10) is provided on both end of the mixing module, and has a twisted portion(11) in a staggered pattern.
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