| 摘要 |
PROBLEM TO BE SOLVED: To simplify the control of flow rate and flow pressure of the polishing slurry to be supplied to each polishing section by providing plural pumps for separately feeding the polishing slurry stored in a buffer means to each polishing section. SOLUTION: Fresh polishing slurry stored in a fresh slurry storage tank 14a is supplied to a buffer tank 26 through a pipeline 14c by a pump 14b. Polishing slurry is supplied from the buffer tank 26 to polishing sections 12a, 12b, 12c through pipelines 25a, 25b, 25c. In a recycle tank 20, the polishing slurry used in the polishing sections 12a, 12b, 12c is filtered, and fed to the buffer tank 26 through a pipeline 20f. With this structure, a pump 14 for fresh slurry supplying unit 14 always supplies the slurry to the buffer tank 26 or with a constant interval, and the complicated control is unnecessary.
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