发明名称 Method of manufacturing electronic device using phase-shifting mask with multiple phase-shift regions
摘要 Transmitting portions of a phase-shifting mask include plural first transmitting areas periodically arranged along a first direction and a second direction and a second transmitting area provided in an area surrounded with adjacent four first transmitting areas among the plural first transmitting areas. The first transmitting areas are formed by recessing a board so that a phase difference of substantially 180 degrees in exposure light can be caused between adjacent first transmitting areas. A phase difference of substantially 90 degrees in the exposure light is caused between the second transmitting area and the surrounding first transmitting areas. Thus, isolated patterns arranged at high density can be formed correspondingly to the first transmitting areas and the second transmitting area.
申请公布号 US6114095(A) 申请公布日期 2000.09.05
申请号 US19980107443 申请日期 1998.06.30
申请人 MATSUSHITA ELECTRONICS CORPORATION 发明人 NAKABAYASHI, TAKASHI;MATSUOKA, KOJI
分类号 G03F1/00;(IPC1-7):G03F9/00;G03C5/00 主分类号 G03F1/00
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