| 摘要 |
PURPOSE: An apparatus for exhausting a remaining gas for a chemical vapor deposition is provided to exhaust a gas remained in a gas supplying pipe when changing the gas supplying pipe into other pipe. CONSTITUTION: An apparatus for exhausting a remaining gas for a chemical vapor deposition comprises a first and a second reaction gas storing tank(12,14) which forms a double supplying system, a gas tube which connects the first and the second reaction gas storing tank with a process chamber(20) and has a plurality of air valves, a nitrogen gas supplying portion(60) which supplies a nitrogen gas to exhaust the remaining gas in a gas exhausting pipe, a vacuum pump(70) which is disposed at an exhausting portion of the process chamber to pump a gas used in the process chamber, and scrubber(80) for diluting the gas exhausted from the process chamber. In the apparatus, a bypass pipe(98) is further provided between the gas exhausting pipe for the nitrogen gas and other gas exhausting pipe. A first valve and a second valve(102, 104) are also provided to the bypass pipe to introduce the remaining gas into the vacuum pump.
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