METHOD OF TREATING A WASTED SLURRYUSED FOR POLISHING PROCESS OF OXIDE LAYER OF SEMICONDUCTOR DEVICE

摘要

PURPOSE: A method for processing waste slurry is provided to recycle waste slurry used in a chemical mechanical process as a basic material for high-added products. CONSTITUTION: A method for processing waste slurry adds/gells strong acid diluted in a slurry used in a chemical mechanical process. The gelled slurry is heated/dried to form a powder. The power is used as minute particles for silica glass synthesis. The slurry consists of F-umed silica of 13-15wt% being KOH or NH4OH solution. At this time, the pH range is 10.5-11.5 and the size of silica is 130-200nm.