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发明名称
Verfahren zur Herstellung eines diffusionsgebundenen Sputtertargetaufbaus
摘要
申请公布号
DE69329124(D1)
申请公布日期
2000.08.31
申请号
DE19936029124
申请日期
1993.09.27
申请人
JAPAN ENERGY CORP., TOKIO/TOKYO
发明人
OHHASHI, TATEO;FUKUYO, HIDEAKI;SAWAMURA, ICHIROH;NAKAMURA, KENICHIROU;FUKUSHIMA, ATSUSHI;NAGASAWA, MASARU
分类号
C23C14/34;H01J37/34;(IPC1-7):C23C14/34
主分类号
C23C14/34
代理机构
代理人
主权项
地址
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