| 摘要 |
PROBLEM TO BE SOLVED: To provide an etching device capable of improving the workability and quality of the etching. SOLUTION: An internal cooling part 16 and an external cooling tank 17 to keep the temperature of the etching solution in an etching tank 10 to be constant are arranged inside and outside the etching tank 10 containing the etching solution consisting of chemicals and their mixture, respectively. The etching solution in the etching tank 10 is cooled to the specified temperature with excellent temperature controllability in a short time by the internal cooling part 16 and the external cooling tank 17 to stabilize the temperature of the etching solution. An article is etched with the etching solution which is stable in temperature at the specified value, and substantially uniform in temperature distribution.
|
