| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of transfer exposure, having smooth connection between stripes and having less irregularity in line width precision. SOLUTION: Two stripes 25 and 26 on a reticle which are transferred side by side on a sensitive substrate 11 are formed on non-adjacent places on the reticle. Accordingly, a space can be secured between the two stripes 25 and 26, and a double exposure region and a margin part, where the pattern of a boundary part is selectively arranged, can be provided. The boundary of the stripes can be provided on an arbitrary place on the margin part.
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