发明名称 Chemically amplified resist polymers
摘要 Copolymers and terpolyers are used in chemically amplified resists. The terpolymers are of the formula: wherein R3 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R4 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R5 is selected from the group consisting of hydrogen and methyl; R6 is selected from the group consisting of t-butyl and tetrahydropyranyl; m and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5.
申请公布号 US6103845(A) 申请公布日期 2000.08.15
申请号 US19970805212 申请日期 1997.02.27
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHOI, SANG-JUN;PARK, CHUN-GEUN;KOH, YOUNG-BUM
分类号 C08F220/12;C08F220/18;C08F220/28;C08F222/06;C08F232/08;C08G61/08;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):C08F222/06 主分类号 C08F220/12
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