| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a process for producing a liquid crystal display device which is judged to be non-defective by preventing the occurrence of a line defect even when a shorting occurs between gate wiring and common wiring on the lower layer of the source wiring of an TFT array substrate of the liquid crystal display device. SOLUTION: When a shorting part 7 has occurred between gate wiring 2 and the common wiring 3 on the lower layer of the source wiring 4 of the TFT array substrate of the liquid crystal display device, the pixel electrode 6 within the pixel where the shorting has occurred and the common wiring 3 is cut in a cutting portion 8a and the connecting portion of the source wiring 4 and a TFT 5 is cut in the cutting portion 8b. As a result, the occurrence of the line defect which is a great defect is prevented and the TFT array substrate decided to be non-defective may be obtained even when the shorting occurs between the gate wiring and the common wiring on the lower layer of the source wiring in the production of the TFT array substrate of the liquid crystal display device. The yield of the liquid crystal display device can thus be improved.</p> |
