发明名称 SILVER/SILVER HALIDE REFERENCE ELECTRODE, ITS FORMATION AND ION-SELECTIVE ELECTRODE
摘要 PROBLEM TO BE SOLVED: To restrict a mixture of heavy metal elements into a generated silver halide layer and correctly determine a specific ion activity by oxidizing a surface of a silver layer by a chelated iron (III) salt in the presence of a halide. SOLUTION: In order to halogenate a silver layer surface, a nonconductive supporting body coated with silver is dipped in a reaction bath with a chelated iron (III) salt and a halide. A concentration of the iron salt in the reaction bath is preferably in the range of 100-500 mM and more preferably in the range of 150-250 mM. After the dipping, the supporting body is washed with water and dried. A chelating agent used is preferably an amino-carboxylic acid compound such as propanediamine tetraacetic acid(PDTA), ethylenediamine tetraacetic acid(EDTA) or the like. Mixture of heavy metal elements (e.g. iron element) in the silver halide is nearly avoided and effects of interfering ions included in a sample can be eliminated.
申请公布号 JP2000221155(A) 申请公布日期 2000.08.11
申请号 JP19990024143 申请日期 1999.02.01
申请人 FUJI PHOTO FILM CO LTD 发明人 TERAJIMA MASAAKI;ITO TOSHIFURU;SESHIMOTO OSAMU
分类号 G01N27/30;G01N27/403 主分类号 G01N27/30
代理机构 代理人
主权项
地址