| 摘要 |
<p>The present invention is directed to a novel apparatus (10) for exposing a pattern onto a photoresist-coated substrate cylinder (12) and the process of using the apparatus. The cylindrical photolithography apparatus (10) of the present invention comprises two adjacent cylindrical support rollers (16) between which a portion of a flexible photomask (14) extends in the form of a loop (18). The photoresist-coated substrate cylinder (12) is received in the loop (18) and a tension device, such as a weight (26), is engaged with the photomask (14) to pull the photomask (14) into contact with the photoresist-coated substrate cylinder (12) over a substantial portion of the circumberence of the substrate cylinder (12). A drive mechanism pulls the photomask (14) over the surface of the photoresist-coated substrate cylinder (12) thereby causing the substrate cylinder (12) to rotate. Exposure light is provided during movement of the photomask (14) to expose a pattern contained on the photomask (14) onto the photoresist.</p> |
