发明名称 |
CYLINDRICAL PHOTOLITHOGRAPHY EXPOSURE PROCESS AND APPARATUS |
摘要 |
The present invention is directed to a novel apparatus (10) for exposing a pattern onto a photoresist-coated substrate cylinder (12) and the process of using the apparatus. The cylindrical photolithography apparatus (10) of the present invention comprises two adjacent cylindrical support rollers (16) between which a portion of a flexible photomask (14) extends in the form of a loop (18). The photoresist-coated substrate cylinder (12) is received in the loop (18) and a tension device, such as a weight (26), is engaged with the photomask (14) to pull the photomask (14) into contact with the photoresist-coated substrate cylinder (12) over a substantial portion of the circumberence of the substrate cylinder (12). A drive mechanism pulls the photomask (14) over the surface of the photoresist-coated substrate cylinder (12) thereby causing the substrate cylinder (12) to rotate. Exposure light is provided during movement of the photomask (14) to expose a pattern contained on the photomask (14) onto the photoresist.
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申请公布号 |
WO0046641(A1) |
申请公布日期 |
2000.08.10 |
申请号 |
WO2000US02460 |
申请日期 |
2000.02.01 |
申请人 |
ELECTROFORMED STENTS, INC. |
发明人 |
HINES, RICHARD, A. |
分类号 |
A61F2/06;A61F2/90;G03F7/20;G03F7/24;(IPC1-7):G03F7/24 |
主分类号 |
A61F2/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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