APPARATUS AND METHOD FOR CONTROLLING DENSITY OF SEMICONDUCTOR CLEANING CHEMICAL

摘要

PURPOSE: An apparatus for controlling a density of semiconductor cleaning chemical is provided to prevent a manufacturing process from being delayed by a controlled density, and to prevent productivity from decreasing, by controlling the density in real time. CONSTITUTION: An apparatus for controlling a density of semiconductor cleaning chemical comprises a storing tank(1), a chemical material supplying element(2), a density detecting element(3), and a system control element(4). The storing tank stores cleaning liquid including a plurality of chemical materials. The chemical material supplying element supplies the plurality of chemical materials to the storing tank separately. The density detecting element measures densities of respective chemical materials among the cleaning liquid in the storing tank, and generates an electrical signal. The system control element determines a quantity of compensation of each chemical material according to the signal from the density detecting element, and supplies the determined quantity of compensation of each chemical material to the storing tank by the chemical material supplying element.