发明名称 DRY ETCHING APPARATUS
摘要 PROBLEM TO BE SOLVED: To prevent damage of a substrate by abnormal discharge at end surfaces and edges of a lower electrode in manufacturing of a liquid crystal display device or the like. SOLUTION: An outer-peripheral insulating member 3 is provided contacting side-surfaces of a lower electrode 2. The distance between lower surface of a substrate 1 to be processed, placed on the lower electrode 2, and upper surface of the outer peripheral insulating substance 3 is kept at 0.1 mm or larger and 1.0 mm or smaller. With this configuration, the space surrounded by the substrate 1 to be processed, the lower electrode 2, and the outer peripheral insulating substance 3, is reduced to suppress the infiltration of radical components related to isotropic etching, and occurrence of abnormal discharge due to electric field concentration is prevented.
申请公布号 JP2000216147(A) 申请公布日期 2000.08.04
申请号 JP19990017988 申请日期 1999.01.27
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 TANABE ATSUSHI;TANAKA YASUO;SOMA KOJI
分类号 H01L21/302;G02F1/13;H01L21/3065;(IPC1-7):H01L21/306 主分类号 H01L21/302
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