APPARATUS FOR TREATING SUBSTRATE WITH ULTRAVIOLET IRRADIATION

摘要

PROBLEM TO BE SOLVED: To eliminate the need for sealing a lamp house housing an excimer lamp and enable the attenuation of a short-wavelength ultraviolet beam irradiated on the surface of a substrate and the production rate of active oxygen to be controlled as desired so as to treat the substrate at optimum conditions. SOLUTION: An excimer lamp 1 is mounted in a lamp house 15 provided on a process chamber 10 in which a substrate 12 is set, the lamp house 15 opens at one side facing the substrate 12, a mixer chamber 21 is disposed in the process chamber 10 and has N gas feed means 16 and dry air feed means 17 from which N gas and dry air are fed at adjustable flow rates through flow meters 24 and flow rate control valves 25, and their mix ratio is controlled to adjust the oxygen concn. in the process chamber 10.