发明名称 METHOD AND APPARATUS FOR FABRICATING PLANAR SAMPLE
摘要 PROBLEM TO BE SOLVED: To provide a method and an apparatus for fabricating a flaky sample in which a planar sample at a region of arbitrary depth from the surface of a sample substrate can be fabricated easily by positioning a desired observation region in the sample substrate accurately without splitting the sample substrate finely. SOLUTION: A sample having a flaky observation part is fabricated by a step for cutting out a wedgy sample piece 9 by making in a sample substrate 1 with a groove 6 perpendicular to the surface of the substrate 1 and a sloped groove 8 while crossing each other by irradiating a focus ion beam 4, a step for fixing the sample piece 9 onto a sample holder 12, and a step for forming a thin wall part substantially parallel with the surface 15 of the a sample substrate 1 and including a desired observation region by irradiating with the focus ion beam 4. According to the method, a planar sample (flaky sample) having a thin wall part substantially parallel with the surface of the sample substrate and including a desired observation region can be prepared easily without splitting the sample substrate, e.g. a wafer, finely.
申请公布号 JP2000214056(A) 申请公布日期 2000.08.04
申请号 JP19990013130 申请日期 1999.01.21
申请人 HITACHI LTD 发明人 UMEMURA KAORU;MADOKORO YUICHI;TOMIMATSU SATOSHI
分类号 H01J37/31;G01N1/28;G01N1/32;(IPC1-7):G01N1/28 主分类号 H01J37/31
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