发明名称 WET ETCHING COMPLETION POINT DETECTING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a wet etching completion point detecting device which is capable of correctly detecting the wet etching completion point. SOLUTION: A wet etching completion point detection device detects the wet etching completion point from the change in the wavelength distribution spectrum to be outputted from a light detection element 2. Relating to this device, a turntable R is rotated integral multiple times, and the trigger signal at which the signal is read integral multiple times from a specified region of the light detection element 2 synchronous with the rotation is given to a motor drive circuit 5 and a light detection element drive circuit 3 to suppress the variance in the data to be finally obtained from the light detection element 2 attributable to the flickering of the rotation of the turntable R, and to correctly detect the wet etching completion point.
申请公布号 JP2000212773(A) 申请公布日期 2000.08.02
申请号 JP19990012052 申请日期 1999.01.20
申请人 HAMAMATSU PHOTONICS KK 发明人 TAKAHASHI TERUO;TAKAHASHI SHUSUKE;WATANABE MOTOYUKI
分类号 B05C11/00;C23F1/08;H01L21/306;(IPC1-7):C23F1/08 主分类号 B05C11/00
代理机构 代理人
主权项
地址