| 摘要 |
PROBLEM TO BE SOLVED: To vacuum-deposit a vapor depositing material on the face to be vapor-deposited to an optional pattern by arranging a forcusing electrode, an acceleration controlling electrode and a deflecting electrode on the space between an electrode in a crucible and an electrifying electrode in the face to be vapor-deposited in a vacuum device. SOLUTION: In an electrode 1 in a crucible having fine pores, a vapor depositing material is evaporated, the pressure at the inside is controlled to the relatively high one, it is blown off from the small pores, is ionized by using a grid 3 and a heat cathode for ionization in the following chamger, is made into the shape of a finer beam by a forcusing electrode 8 and is deflected by deflecting electrodes A, A', B and B', and an optional pattern is crashed into the face 10 to be vapor-deposited to form a thin film.
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