发明名称 Photosensitive polyimidosiloxane compositions and insulating films made thereof
摘要 A photosensitive polyimidosiloxane composition comprising a polyimidosiloxane comprising 15-80 mole percent of the units, wherein X represents CO, O or a direct bond and R3 represents an aromatic residue containing a photosensitive group with an unsaturated hydrocarbon group, and 85-20 mole percent of the units, wherein X is as defined above, each R4 independently represents a divalent hydrocarbon residue, each R5 independently represents an alkyl group of 1-3 carbon atoms and 1 represents an integer of 3-30, a finely divided inorganic filler, and an organic solvent. The composition provides films having excellent light transmittance.
申请公布号 US6096480(A) 申请公布日期 2000.08.01
申请号 US19970985872 申请日期 1997.12.05
申请人 UBE INDUSTRIES, LTD. 发明人 ISHIKAWA, SEIJI;YASUNO, HIROSHI;SAKURAI, HIROYUKI
分类号 C08G73/10;C08G77/455;C09D183/10;G03F7/038;(IPC1-7):G03F7/038 主分类号 C08G73/10
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