| 摘要 |
PROBLEM TO BE SOLVED: To maximize the synthesis yield of a photoresist copolymer, to reduce the unit synthesis cost of the copolymer and to enable mass production by using a photoresist crosslinker containing a specified compound. SOLUTION: This photoresist crosslinker contains a compound of the formula, wherein V is CH2, CH2CH2, oxygen or sulfur, Y is 1-12C linear or branched alkyl, oxygen or 1-12C linear or branched ether, R' and R" are each H or CH3, (i) is an integer of 1-5 and (n) is an integer of 0-3. The compound of the formula is selected from the group consisting of ethylene glycol-di(5-norbornene-2- carboxylic acid-3-carboxylate), 1,3-propanediol-di(5-norbornene-2-carboxylic acid-3- carboxylate), 1,4-butanediol-di(5-norbornene-2-carboxylic acid-3-carboxylate), etc. |
