| 摘要 |
Photomask comprises a recessed section (23) in the surface of a transparent substrate (10), a shadow pattern (11) with shadow section, and reflection prevention sections. Each reflection prevention section is formed on and below the shadow section. The shadow section is made of a shadow film and is formed in the recessed section. Independent claims are also included for: (a) a photomask comprising recessed section (103) in the surface of a transparent substrate (10), a shadow pattern (11) with shadow section, and a flat phase shift pattern (102) that is selective on the transparent substrate with the shadow pattern in the recessed section; (b) a process for the production of the photomask comprising forming a resist film on a transparent substrate, forming a required pattern on the resist film by developing the film after the film has been selectively irradiated, forming recessed sections in the transparent substrate by selective etching of the substrate using the resist film as mask, removing the film from the substrate, forming a first reflection prevention film in each recessed section, forming a shadow film on the reflection prevention film in the recessed section, forming a shadow pattern by chemical and mechanical polishing the shadow film, and then forming a second reflect ion prevention film. |
