| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for cleaning a smooth surface with laser beam by which the surface of a disk of a hard disk apparatus or silicon wafer or the like to be cleaned can be cleaned within a short time at low cost without damaging the surface to be cleaned. SOLUTION: In this smooth surface cleaning method by laser beam for removing polluting substances adhering to a smooth surface 3 to be cleaned by radiating laser beam to at least a part of the surface 3 to be cleaned, laser beam 1 is so radiated to the surface 3 to be cleaned as to keep 30 deg. of the angle between the beam center axis of the laser beam 1 reaching the surface to be cleaned and the surface 3 to be cleaned.
|
