| 摘要 |
PURPOSE: A system for controlling the injection of ion is provided to control a parameter in an injection process by using the result of optical analysis for the density of charge colliding with a material, and for the ion existed in plasma gas. CONSTITUTION: Density of ion is checked for spectrum analyzing the density of ion to record the data of spectrum analysis. Then, the spectrum analyzing data are compared with a recorded database(185) in a storing medium for deciding the satisfaction of the ingredient in the ion density. Herein, the recorded database is formed by storing the spectrum analyzing data for the utilization of the next data. Then, the ion is collided with the surface of a material. Thus, the dose amount of the ion injected to the material is measured by the ion of the ion density. When the dose amount reaches a certain amount, the injection of the ion is stopped. Herein, the recorded database includes mass analyzing data having relation to the spectrum analyzing data.
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